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Manufacturing process of semiconductor, liquid crystal panel, and variety of disks, manufacturing process of the lens and the magnetic tape, production process of pharmaceuticals, various maintenance and cleaning of machine in a clean room, wiping work of precision before painting
Water Retention Value (%)
Dropping Method (sec)
1.8 water, oil less than 1.0
Basis Weight (g/m2)
Ion Elution (microgram/g)
Shrinking Ratio (%)
Vertical 1.1, Horizontal -1.9
Vertical 134.6, Horizontal 223.6
Tensile Strength N(kgf)
Vertical 911 (92.9) Horizontal 389 (39.7)
Number of Generated Particles (particles/f3)
0: 5.0microm size of the two-particle: 2.0microm particle size 4: 1.0microm particle size of 12: 0.5microm particle size of 23: 0.3microm size particle